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TSMC N4X process technology is designed to produce microcircuits from which maximum performance is required

TSMC introduced the N4X process technology, optimized for the performance criterion of manufactured microcircuits. This is the first process technology of its kind among TSMC's 5-nanometer generation process technology. The microcircuits made with its use are designed for the highest clock frequencies among the microcircuits manufactured according to the technological processes of this generation. TSMC's performance optimized workflows can be identified by the “X” in the designator.

Optimization affects not only transistors, which are designed for higher currents and frequencies, but also the internal metal stack. In addition, the new technical process allows the formation of ultra-high-capacity capacitors with a metal-insulator-metal structure.

All of this is said to yield a performance gain of up to 15% over the N5 or up to 4% over the N4P at 1.2 V. Additional potential for increased performance is provided by the ability to use control voltages greater than 1.2 V. Customers can Accelerate N4X development by taking advantage of the N5 general design rules for this process. TSMC expects high-risk production using N4X to begin in the first half of 2023.

TSMC N4X process technology is designed to produce microcircuits from which maximum performance is required